HIGH-RATE REACTIVE SPUTTER DEPOSITION OF ZIRCONIUM DIOXIDE

被引:58
作者
JONES, F
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 06期
关键词
D O I
10.1116/1.575479
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:3088 / 3097
页数:10
相关论文
共 18 条
[1]  
BAILEY JE, 1972, BRIT CERAM TRANS J, V71, P25
[2]  
Chu W. K., 1978, BACKSCATTERING SPECT
[3]   CRYSTALLINE HYDROUS ZIRCONIA [J].
CLEARFIELD, A .
INORGANIC CHEMISTRY, 1964, 3 (01) :146-&
[4]  
DUWEZ P, 1950, J AM CERAM SOC, V33, P274
[5]   POLYMORPHIC BEHAVIOR OF THIN EVAPORATED FILMS OF ZIRCONIUM AND HAFNIUM OXIDES [J].
ELSHANSHOURY, IA ;
RUDENKO, VA ;
IBRAHIM, IA .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1970, 53 (05) :264-+
[6]   REACTIVE DEPOSITION OF LOW-LOSS AL2O3 OPTICAL-WAVEGUIDES BY MODIFIED DC PLANAR MAGNETRON SPUTTERING [J].
ESTE, G ;
WESTWOOD, WD .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (03) :1238-1247
[7]   OCCURRENCE OF METASTABLE TETRAGONAL ZIRCONIA AS A CRYSTALLITE SIZE EFFECT [J].
GARVIE, RC .
JOURNAL OF PHYSICAL CHEMISTRY, 1965, 69 (04) :1238-&
[10]  
LODERMIK WH, 1980, THIN SOLID FILMS, V73, P155