CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE AND ITS APPLICATIONS

被引:33
|
作者
BRUTSCH, R
机构
关键词
D O I
10.1016/0040-6090(85)90326-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:313 / 318
页数:6
相关论文
共 50 条
  • [21] ADHESION IMPROVEMENTS IN SILICON-CARBIDE DEPOSITED BY PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION
    MERNAGH, VA
    KELLY, TC
    AHERN, M
    KENNEDY, AD
    ADRIAANSEN, APM
    RAMAEKERS, PPJ
    MCDONNELL, L
    KOEKOEK, R
    SURFACE & COATINGS TECHNOLOGY, 1991, 49 (1-3): : 462 - 467
  • [22] SILICON-CARBIDE COATING ON MOLYBDENUM BY CHEMICAL VAPOR-DEPOSITION AND ITS STABILITY UNDER THERMAL CYCLE CONDITIONS
    FUKUTOMI, M
    KITAJIMA, M
    OKADA, M
    WATANABE, R
    JOURNAL OF NUCLEAR MATERIALS, 1979, 87 (01) : 107 - 116
  • [23] CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE AND SILICON-NITRIDE - CHEMISTRYS CONTRIBUTION TO MODERN SILICON CERAMICS
    FITZER, E
    HEGEN, D
    ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, 1979, 18 (04) : 295 - 304
  • [24] GAS-PHASE KINETICS ANALYSIS AND IMPLICATIONS FOR SILICON-CARBIDE CHEMICAL VAPOR-DEPOSITION
    STINESPRING, CD
    WORMHOUDT, JC
    JOURNAL OF CRYSTAL GROWTH, 1988, 87 (04) : 481 - 493
  • [25] THE EFFECT OF ARGON ADDITION ON THE MICROSTRUCTURE, TEXTURE AND PHASES OF SILICON-CARBIDE PREPARED BY CHEMICAL VAPOR-DEPOSITION
    LU, YM
    HON, MH
    NIPPON SERAMIKKUSU KYOKAI GAKUJUTSU RONBUNSHI-JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1991, 99 (12): : 1175 - 1178
  • [26] GROWTH OF SOLID-SOLUTIONS OF ALUMINUM NITRIDE AND SILICON-CARBIDE BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    JENKINS, I
    IRVINE, KG
    SPENCER, MG
    DMITRIEV, V
    CHEN, N
    JOURNAL OF CRYSTAL GROWTH, 1993, 128 (1-4) : 375 - 378
  • [27] CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE POWDERS USING PULSED CO2-LASERS
    SCHOLZ, M
    FUSS, W
    KOMPA, KL
    ADVANCED MATERIALS, 1993, 5 (01) : 38 - 40
  • [28] THE EFFECT OF SUBSTRATE MATERIALS ON THE MICROSTRUCTURE AND PHASES OF SILICON-CARBIDE PREPARED BY CHEMICAL VAPOR-DEPOSITION (CVD)
    PARK, YS
    KIM, MH
    LEE, JY
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1989, 8 (03) : 321 - 325
  • [29] Initial decomposition of methyltrichlorosilane in the chemical vapor deposition of silicon-carbide
    Wang, Xin
    Su, Kehe
    Deng, Juanli
    Liu, Yan
    Wang, Yanli
    Zeng, Qingfeng
    Cheng, Laifei
    Zhang, Litong
    COMPUTATIONAL AND THEORETICAL CHEMISTRY, 2011, 967 (2-3) : 265 - 272
  • [30] LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM ORGANOPOLYSILANES
    CHIU, HT
    WU, PF
    JOURNAL OF THE CHINESE CHEMICAL SOCIETY, 1991, 38 (03) : 231 - 234