CHANGES IN COMPOSITION AND DEPOSITION RATES IN THE REACTIVE SPUTTERING OF COPPER, TITANIUM, AND YTTRIUM EXPOSED TO OXYGEN

被引：19
作者：
OHWAKI, T
TAGA, Y
机构：
来源：
APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 17期
关键词：
D O I：
10.1063/1.101299
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：1664 / 1665
页数：2
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