CHANGES IN COMPOSITION AND DEPOSITION RATES IN THE REACTIVE SPUTTERING OF COPPER, TITANIUM, AND YTTRIUM EXPOSED TO OXYGEN

被引：19

作者：

OHWAKI, T

TAGA, Y

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 17期

关键词：

D O I：

10.1063/1.101299

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1664 / 1665

页数：2

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共 9 条

[1] DEPOSITION RATE OF METALLIC THIN-FILMS IN REACTIVE SPUTTERING PROCESS
ABE, T
YAMASHINA, T
[J]. THIN SOLID FILMS, 1975, 30 (01) : 19 - 27
[2] SPUTTERING OF METAL TARGETS UNDER INCREASED OXYGEN PARTIAL-PRESSURE
BETZ, G
HUSINSKY, W
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1986, 13 (1-3) : 343 - 347
[3] REACTIVE ION-BEAM SPUTTERING OF THIN-FILMS OF LEAD, ZIRCONIUM AND TITANIUM
CASTELLANO, RN
[J]. THIN SOLID FILMS, 1977, 46 (02) : 213 - 221
[4] EFFECT OF TARGET OXIDATION ON REACTIVE SPUTTERING RATES OF TITANIUM IN ARGON-OXYGEN PLASMAS
DONAGHEY, LF
GERAGHTY, KG
[J]. THIN SOLID FILMS, 1976, 38 (03) : 271 - 280
[5] REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES
HELLER, J
[J]. THIN SOLID FILMS, 1973, 7 (02) : 163 - 176
[6] SPUTTERING OF METALS IN PRESENCE OF REACTIVE GASES
HRBEK, J
[J]. THIN SOLID FILMS, 1977, 42 (02) : 185 - 191
[7] KELLY R, 1987, NUCL INSTRUM METH B, V18, P388
[8] SPECTROSCOPIC INVESTIGATION OF REACTIVE SPUTTERING OF ALUMINIUM
STIRLING, AJ
WESTWOOD, WD
[J]. THIN SOLID FILMS, 1971, 7 (01) : 1 - &
[9] LEED-AES STUDY OF SULFIDE SINGLE-CRYSTALS
TAGA, Y
ISOGAI, A
NAKAJIMA, K
[J]. SURFACE SCIENCE, 1979, 86 (JUL) : 591 - 600