The interlayer Γ-X scattering rate of photoexcited electrons was measured in staggered-alignment type II AlGaAs-AlAs ternary alloy multi-quantum-well structures. The scattering process was directly probed by the femtosecond pump-and-probe spectroscopy. The mean Γ-X scattering time of electrons across the interface at 4.2 K was determined to be 1.0-1.2 ps, which is longer than that observed recently in GaAs-AlAs short period superlattices and is 20 times longer than that observed in bulk GaAs. The slowing mechanism is ascribed to the small penetration of the evanescent Γ electrons into the AlAs barrier layers. © 1990.