THE ETCHING OF CU(100) WITH CL-2

被引：72

作者：

WINTERS, HF

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.573309

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：786 / 790

页数：5

共 9 条

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[7] CHLORINE ADSORPTION ON COPPER .2. PHOTOEMISSION FROM CU(001)C(2X2)-CL AND CU(111) (SQUARE-ROOT 3 X SQUARE-ROOT 3)R30-DEGRES-CL [J].

WESTPHAL, D ;

GOLDMANN, A .

SURFACE SCIENCE, 1983, 131 (01) :113-138

[8] RF INDUCTION TECHNIQUE FOR SAMPLE HEATING IN SURFACE SCIENCE EXPERIMENTS [J].

WINTERS, HF ;

SCHLAEGEL, J ;

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04) :1605-1608

[9] ETCH PRODUCTS FROM THE REACTION ON CL-2 WITH AL(100) AND CU(100) AND XEF2 WITH W(111) AND NB [J].

WINTERS, HF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :9-15

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