ION CLUSTER BEAM DEPOSITION OF PHTHALOCYANINE FILMS

被引：4
作者：
FEJFAR, A
BIEDERMAN, H
机构：
[1] Charles University, Praha 8
来源：
INTERNATIONAL JOURNAL OF ELECTRONICS | 1992年 / 73卷 / 05期
关键词：
D O I：
10.1080/00207219208925766
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The ionized cluster beam technique was investigated as a method which could bridge the gap between evaporation and plasma polymerization in organic thin film deposition. The results achieved for copper phthalocyanine as a model material are reported.
引用
收藏
页码：1051 / 1053
页数：3
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