CONCENTRATION OF ELECTRONS IN SELECTIVELY DOPED GAALAS/GAAS HETEROJUNCTION AND ITS DEPENDENCE ON SPACER-LAYER THICKNESS AND GATE ELECTRIC-FIELD

被引:86
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HIRAKAWA, K
SAKAKI, H
YOSHINO, J
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10.1063/1.95202
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O59 [应用物理学];
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页码:253 / 255
页数:3
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[2]   CHARACTERISTICS OF MODULATION-DOPED ALXGA1-XAL/GAAS FIELD-EFFECT TRANSISTORS - EFFECT OF DONOR-ELECTRON SEPARATION [J].
DRUMMOND, TJ ;
FISCHER, R ;
SU, SL ;
LYONS, WG ;
MORKOC, H ;
LEE, K ;
SHUR, MS .
APPLIED PHYSICS LETTERS, 1983, 42 (03) :262-264
[3]   IMPROVED ELECTRON-MOBILITY HIGHER THAN 106 CM2/VS IN SELECTIVELY DOPED GAAS/N-ALGAAS HETEROSTRUCTURES GROWN BY MBE [J].
HIYAMIZU, S ;
SAITO, J ;
NANBU, K ;
ISHIKAWA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (10) :L609-L611
[4]   A NEW ALGAAS/GAAS HETEROJUNCTION FET WITH INSULATED GATE STRUCTURE (MISSFET) [J].
HOTTA, T ;
SAKAKI, H ;
OHNO, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (02) :L122-L124
[5]  
HOTTA T, UNPUB
[6]   A NEW HIGHLY-CONDUCTIVE (ALGA)AS/GAAS/(ALGA)AS SELECTIVELY-DOPED DOUBLE-HETEROJUNCTION FIELD-EFFECT TRANSISTOR (SD-DH-FET) [J].
INOUE, K ;
SAKAKI, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (02) :L61-L63
[7]   SI AND SN DOPING IN ALXGA1-XAS GROWN BY MBE [J].
ISHIBASHI, T ;
TARUCHA, S ;
OKAMOTO, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (08) :L476-L478
[8]   A NEW FIELD-EFFECT TRANSISTOR WITH SELECTIVELY DOPED GAAS-N-ALXGA1-XAS HETEROJUNCTIONS [J].
MIMURA, T ;
HIYAMIZU, S ;
FUJII, T ;
NANBU, K .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (05) :L225-L227
[9]   SELF-CONSISTENT RESULTS FOR N-TYPE SI INVERSION LAYERS [J].
STERN, F .
PHYSICAL REVIEW B, 1972, 5 (12) :4891-&
[10]   2-DIMENSIONAL ELECTRON-GAS AT A SEMICONDUCTOR-SEMICONDUCTOR INTERFACE [J].
STORMER, HL ;
DINGLE, R ;
GOSSARD, AC ;
WIEGMANN, W ;
STURGE, MD .
SOLID STATE COMMUNICATIONS, 1979, 29 (10) :705-709