DEPENDENCE OF DIFFUSION-LAYER THICKNESS ON CURRENT-DENSITY

被引：0
|
作者：
POLYAKOV, PV
MIKHALEV, YG
ISAEVA, LA
机构：
[1] M. I. Kalinin Inst of Nonferrous, Metals, Krasnoyarsk, USSR, M. I. Kalinin Inst of Nonferrous Metals, Krasnoyarsk, USSR
来源：
SOVIET ELECTROCHEMISTRY | 1985年 / 21卷 / 06期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
CATHODES
引用
收藏
页码：802 / 802
页数：1
相关论文
共 50 条
  • [1] DEPENDENCE OF DIFFUSION-LAYER THICKNESS ON CURRENT-DENSITY
    ROTINYAN, AL
    SHOSHINA, IA
    SOVIET ELECTROCHEMISTRY, 1983, 19 (11): : 1434 - 1434
  • [2] QUANTITATIVE CHARACTERIZATION OF CURRENT-INDUCED DIFFUSION LAYERS AT CATION-EXCHANGE MEMBRANES .2. DETERMINATION OF DIFFUSION-LAYER THICKNESS AND CONCENTRATION POLARIZATION IN DEPENDENCE ON CURRENT-DENSITY
    LERCHE, D
    BIOELECTROCHEMISTRY AND BIOENERGETICS, 1975, 2 (04): : 304 - 313
  • [3] LOW CURRENT-DENSITY MICROCELL DIFFUSION LAYER THICKNESS AT SHALLOW VERTICAL ELECTRODES
    OBRIEN, RN
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (05) : 589 - &
  • [4] CURRENT-DENSITY FLUCTUATIONS WITHIN A TURBULENT-DIFFUSION BOUNDARY-LAYER OF CONSTANT THICKNESS
    SKURYGIN, EF
    VOROTYNTSEV, MA
    MARTEMYANOV, SA
    SOVIET ELECTROCHEMISTRY, 1989, 25 (05): : 592 - 597
  • [5] DEPENDENCE OF ELECTROMIGRATION DAMAGE ON CURRENT-DENSITY
    HINODE, K
    FURUSAWA, T
    HOMMA, Y
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (01) : 201 - 206
  • [6] THE DEPENDENCE OF ELECTROOSMOTIC FLOW ON CURRENT-DENSITY AND TIME
    BRYDGES, TG
    LORIMER, JW
    JOURNAL OF MEMBRANE SCIENCE, 1983, 13 (03) : 291 - 305
  • [7] Non-monotonic dependence of the current density on the thickness of the photoactive layer
    Saracco, G.
    Barbero, G.
    Hernandez, S.
    Alexe-Ionescu, A. L.
    JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 2017, 788 : 61 - 65
  • [8] CURRENT-DENSITY DEPENDENCE OF THE VORTEX PINNING ENERGY IN YBACUO
    LANG, W
    FUSSENEGGER, C
    SCHWAB, P
    WANG, XZ
    BAUERLE, D
    PHYSICA B, 1994, 194 : 1859 - 1860
  • [9] Current-Density Dependence on Ag eFUSEs With TiN Underlayers
    Indluru, Anil
    Misra, Ekta
    Alford, Terry L.
    IEEE ELECTRON DEVICE LETTERS, 2009, 30 (11) : 1134 - 1136
  • [10] ON THE CURRENT-DENSITY DEPENDENCE OF ELECTROMIGRATION IN THIN-FILMS
    HUMMEL, RE
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1988, 107 (02): : K175 - K179
12345