ELECTRICAL-RESISTIVITY AND HALL-EFFECT IN FE-ZR AMORPHOUS SPUTTERED FILMS

被引:36
作者
FUKAMICHI, K [1 ]
GAMBINO, RJ [1 ]
MCGUIRE, TR [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1063/1.330800
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:2310 / 2312
页数:3
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