1ST OBSERVATION OF STRAINED SILOXANE BONDS ON SILICON-OXIDE THIN-FILMS

被引：54

作者：

CHIANG, CM ^{[1
]}

ZEGARSKI, BR ^{[1
]}

DUBOIS, LH ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

JOURNAL OF PHYSICAL CHEMISTRY | 1993年 / 97卷 / 27期

关键词：

D O I：

10.1021/j100129a004

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We provide the first experimental evidence that edge-shared tetrahedra ( > Si < o/o > Si < ) can exist on the surface of silicon oxide thin films. These sites are characterized by infrared active Si-O-Si bending modes at 888 and 908 cm-1 and by their high reactivity toward both water and triethylsilanol. They are formed by annealing at high temperature (greater-than-or-equal-to 1400 K) and not by the recombination of surface silanol groups. Our observations confirm recent theoretical predictions.

引用

页码：6948 / 6950

页数：3

共 50 条

[1] A NEUTRON REFLECTIVITY STUDY OF HYDROGENATED SILICON SILICON-OXIDE THIN-FILMS
ASHWORTH, CD
MESSOLORAS, S
STEWART, RJ
PENFOLD, J
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1989, 4 (01) : 1 - 9
[2] TEMPERATURE-DEPENDENCE OF CURRENTS IN THIN-FILMS OF SILICON-OXIDE
BRAZIS, R
PIPINYS, P
RIMEIKA, A
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1984, 83 (01): : K69 - K71
[3] STRUCTURE OF PRECURSING THIN-FILMS OF AN ANIONIC SURFACTANT ON A SILICON-OXIDE SILICON SURFACE
BIRCH, WR
KNEWTSON, MA
GAROFF, S
SUTER, RM
SATIJA, S
LANGMUIR, 1995, 11 (01) : 48 - 56
[4] DEPOSITION OF PLASMA SILICON-OXIDE THIN-FILMS IN A PRODUCTION PLANAR REACTOR
HOLLAHAN, JR
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (06) : 930 - 934
[5] PHOTOINDUCED CHEMICAL VAPOR-DEPOSITION OF SILICON-OXIDE THIN-FILMS
GONZALEZ, P
FERNANDEZ, D
POU, J
GARCIA, E
SERRA, J
LEON, B
PEREZAMOR, M
THIN SOLID FILMS, 1992, 218 (1-2) : 170 - 181
[6] REACTIVE MAGNETRON SPUTTERED ZIRCONIUM-OXIDE AND ZIRCONIUM SILICON-OXIDE THIN-FILMS
RUSSAK, MA
JAHNES, CV
KATZ, EP
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 1248 - 1253
[7] POLYSILICON THIN-FILMS - A UK 1ST
DETTMER, R
IEE REVIEW, 1989, 35 (01): : 18 - 18
[8] IR ELLIPSOMETRY INVESTIGATIONS OF N2O-NITRIDED SILICON-OXIDE THIN-FILMS ON SILICON
WEIDNER, M
ROSELER, A
EICHLER, M
THIN SOLID FILMS, 1993, 234 (1-2) : 337 - 341
[9] OBSERVATION AND PREDICTION OF 1ST PHASE FORMATION IN BINARY CU-METAL THIN-FILMS
LI, J
STRANE, JW
RUSSELL, SW
HONG, SQ
MAYER, JW
MARAIS, TK
THERON, CC
PRETORIUS, R
JOURNAL OF APPLIED PHYSICS, 1992, 72 (07) : 2810 - 2816
[10] HYDROGEN PERMEATION THROUGH THIN SILICON-OXIDE FILMS
NICKEL, NH
JACKSON, WB
WU, IW
TSAI, CC
CHIANG, A
PHYSICAL REVIEW B, 1995, 52 (11) : 7791 - 7794

← 1 2 3 4 5 →