ELECTRONIC-STRUCTURE OF AMORPHOUS SI3N4 IN THE CLUSTER-BETHE-LATTICE APPROXIMATION

被引:17
作者
FERREIRA, EC
DASILVA, CETG
机构
[1] ECOLE NORMALE SUPER,PHYS SOLIDES GRP,F-75231 PARIS 05,FRANCE
[2] UNIV ESTADUAL CAMPINAS,INST FIS,BR-13100 CAMPINAS,SP,BRAZIL
来源
PHYSICAL REVIEW B | 1985年 / 32卷 / 12期
关键词
D O I
10.1103/PhysRevB.32.8332
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:8332 / 8337
页数:6
相关论文
共 13 条
[1]   X-RAY-DIFFRACTION STUDY OF THE AMORPHOUS STRUCTURE OF CHEMICALLY VAPOR-DEPOSITED SILICON-NITRIDE [J].
AIYAMA, T ;
FUKUNAGA, T ;
NIIHARA, K ;
HIRAI, T ;
SUZUKI, K .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1979, 33 (02) :131-139
[2]   PHOTOELECTRONIC PROPERTIES OF AMORPHOUS-SILICON NITRIDE COMPOUNDS [J].
ALVAREZ, F ;
CHAMBOULEYRON, I .
SOLAR ENERGY MATERIALS, 1984, 10 (02) :151-170
[3]   OPTICAL-PROPERTIES, BAND-GAP, AND SURFACE-ROUGHNESS OF SI3N4 [J].
BAUER, J .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1977, 39 (02) :411-418
[4]  
Joannopoulos J., 1976, SOLID STATE PHYS, V31, P71
[5]   ELECTRONIC-STRUCTURE OF HYDROGENATED AND UNHYDROGENATED AMORPHOUS SINX (0-LESS-THAN-X-LESS-THAN-1.6) - A PHOTOEMISSION-STUDY [J].
KARCHER, R ;
LEY, L ;
JOHNSON, RL .
PHYSICAL REVIEW B, 1984, 30 (04) :1896-1910
[6]   BULK ELECTRONIC-STRUCTURE OF SIO2 [J].
LAUGHLIN, RB ;
JOANNOPOULOS, JD ;
CHADI, DJ .
PHYSICAL REVIEW B, 1979, 20 (12) :5228-5237
[7]   LOCALIZED STATES AT THE CONDUCTION-BAND EDGE OF AMORPHOUS-SILICON NITRIDE DETECTED BY RESONANCE PHOTOEMISSION [J].
LEY, L ;
KARCHER, R ;
JOHNSON, RL .
PHYSICAL REVIEW LETTERS, 1984, 53 (07) :710-713
[8]   STRUCTURE CHARACTERIZATION OF CVD AMORPHOUS SI3N4 BY PULSED NEUTRON TOTAL SCATTERING [J].
MISAWA, M ;
FUKUNAGA, T ;
NIIHARA, K ;
HIRAI, T ;
SUZUKI, K .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1979, 34 (03) :313-321
[9]   PREPARATION, CHARACTERIZATION AND APPLICATIONS OF SILICON-NITRIDE THIN-FILMS [J].
MOROSANU, CE .
THIN SOLID FILMS, 1980, 65 (02) :171-208
[10]   ELECTRONIC-STRUCTURES OF BETA-SILICON AND ALPHA-SILICON NITRIDE [J].
REN, SY ;
CHING, WY .
PHYSICAL REVIEW B, 1981, 23 (10) :5454-5463