THERMAL AND ION-INDUCED DISSOCIATION OF NISI AND NISI2 IN CONTACT WITH NICKEL

被引：14
作者：
HUNG, LS
MAYER, JW
机构：
来源：
THIN SOLID FILMS | 1983年 / 109卷 / 01期
关键词：
D O I：
10.1016/0040-6090(83)90033-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：85 / 92
页数：8
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