ULTRAVIOLET-LASER CONTAMINATION OF QUARTZ OPTICS

被引：3

作者：

HILLS, MM

COLEMAN, DJ

机构：

[1] Mechanics and Materials Technology Center, The Aerospace Corporation, El Segundo, CA

来源：

APPLIED OPTICS | 1993年 / 32卷 / 22期

关键词：

D O I：

10.1364/AO.32.004174

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Laboratory experiments were conducted to determine the cause of degradation of two quartz polarizers used in conjunction with a cw UV laser. UV transmission spectra and x-ray photoelectron spectroscopic measurements of the damaged optic and laser-induced photolysis of one of the adhesives used to hold the polarizer in position indicate that the degradation is most probably a result of UV photolysis of adhesive residue. It would therefore be prudent to avoid use of all organic adhesives in UV laser optics. An alternative method of holding a quartz beam splitter without adhesives is described and is currently being used.

引用

页码：4174 / 4177

页数：4

共 5 条

[1] CONTROLLED ETCHING OF SILICATE-GLASSES BY PULSED ULTRAVIOLET-LASER RADIATION [J].