MODEL CALCULATION OF ION COLLECTION IN PRESENCE OF SPUTTERING .1. ZERO ORDER APPROXIMATION

被引:164
作者
SCHULZ, F [1 ]
WITTMAACK, K [1 ]
机构
[1] GESELL STRAHLEN & UMWELT FORSCH MBH,PHYS TECHN ABT,D-8042 NEUHERBERG,FED REP GER
来源
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1976年 / 29卷 / 01期
关键词
D O I
10.1080/00337577608233481
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
引用
收藏
页码:31 / 40
页数:10
相关论文
共 43 条
[1]   COLLECTION AND SPUTTERING EXPERIMENTS WITH NOBLE GAS IONS [J].
ALMEN, O ;
BRUCE, G .
NUCLEAR INSTRUMENTS & METHODS, 1961, 11 (02) :257-278
[2]   SPUTTERING EXPERIMENTS IN THE HIGH ENERGY REGION [J].
ALMEN, O ;
BRUCE, G .
NUCLEAR INSTRUMENTS & METHODS, 1961, 11 (02) :279-289
[3]   DOSE DEPENDENCE OF 45 keV V + AND Bi + ION SPUTTERING YIELD OF COPPER. [J].
Andersen, Hans Henrik .
Radiation Effects, 1973, 19 (04) :257-261
[4]   HEAVY-ION SPUTTERING YIELD OF SILICON [J].
ANDERSEN, HH ;
BAY, HL .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (05) :1919-1921
[5]   ANOMALOUSLY HIGH COLLECTION OF COPPER IONS IMPLANTED IN ALUMINIUM [J].
ARMINEN, E ;
FONTELL, A ;
LINDROOS, VK .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1971, 4 (03) :663-&
[6]  
ARMINEN E, 1971, ANN ACAD SCI FENNI A, V6
[7]  
Biersack J. P., 1973, Radiation Effects, V19, P249, DOI 10.1080/00337577308232256
[8]   RANGE PARAMETER DISTORTION IN HEAVY-ION IMPLANTATION [J].
BLANK, P ;
WITTMAACK, K .
PHYSICS LETTERS A, 1975, 54 (01) :33-34
[9]  
BLANK P, 1975, VERHANDL DPG, V10, P575
[10]  
BLANK P, IN PRESS