STRUCTURAL AND ELECTRICAL-PROPERTIES OF CRSI2 THIN-FILM RESISTORS

被引:28
作者
HIEBER, K [1 ]
DITTMANN, R [1 ]
机构
[1] SIEMENS AG,FORSCH LAB,D-8000 MUNICH 80,FED REP GER
关键词
D O I
10.1016/0040-6090(76)90033-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
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页码:357 / 360
页数:4
相关论文
共 11 条
[1]   PREPARATION AND PROPERTIES OF TANTALUM THIN-FILMS [J].
BAKER, PN .
THIN SOLID FILMS, 1972, 14 (01) :3-25
[2]   TANTALUM THIN-FILM RESISTORS [J].
DUCKWORTH, RG .
THIN SOLID FILMS, 1972, 10 (03) :337-+
[3]  
EISENKOLB F, 1963, FORTSCHRITTE PULVERM, V2, P455
[4]  
HEID K, 1973, SOLID STATE TECHNOL, V16, P56
[5]   STRUCTURAL AND ELECTRICAL PROPERTIES OF CHROMIUM AND NICKEL FILMS EVAPORATED IN PRESENCE OF OXYGEN [J].
HIEBER, K ;
LASSAK, L .
THIN SOLID FILMS, 1974, 20 (01) :63-73
[6]   STRUCTURAL AND ELECTRICAL PROPERTIES OF EVAPORATED CR-NI FILMS AS A FUNCTION OF GAS PRESSURE [J].
LASSAK, L ;
HIEBER, K .
THIN SOLID FILMS, 1973, 17 (01) :105-111
[7]  
NIKITIN EN, 1961, SOV PHYS-SOL STATE, V2, P2389
[8]   CRYSTAL-GROWTH AND THERMOELECTRIC PROPERTIES OF CHROMIUM DISILICIDE [J].
NISHIDA, I .
JOURNAL OF MATERIALS SCIENCE, 1972, 7 (10) :1119-&
[9]  
Politycki A., 1974, Siemens Forschungs- und Entwicklungsberichte, V3, P248
[10]  
SWANSON JG, 1967, THIN SOLID FILMS, V1, P183