CHARACTERIZATION OF SILICON-NITRIDE FILMS FORMED IN AN RF GLOW-DISCHARGE

被引：7
|
作者：
MURAKAMI, K
TAKEUCHI, T
ISHIKAWA, K
YAMAMOTO, T
机构：
来源：
APPLIED SURFACE SCIENCE | 1988年 / 33-4卷
关键词：
D O I：
10.1016/0169-4332(88)90375-3
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：742 / 749
页数：8
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