THERMAL-OXIDATION OF REACTIVELY SPUTTERED TITANIUM NITRIDE AND HAFNIUM NITRIDE FILMS

被引：80
|
作者：
SUNI, I
SIGURD, D
HO, KT
NICOLET, MA
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 05期
关键词：
D O I：
10.1149/1.2119919
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1210 / 1214
页数：5
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