MULTI-COIL SYSTEM FOR ELECTRON-CYCLOTRON RESONANCE PLASMA GENERATION

被引：1

作者：

NAKAMURA, T ^{[1
]}

SAMUKAWA, S ^{[1
]}

ISHIDA, T ^{[1
]}

ISHITANI, A ^{[1
]}

KAWASE, Y ^{[1
]}

机构：

[1] NEC CORP LTD,VLSI DEV DIV,DEPT PROC DEV,SAGAMIHARA,KANAGAWA 229,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1992年 / 31卷 / 12B期

关键词：

ECR PLASMA; MULTI-COIL SYSTEM; MAGNETIC FIELD UNIFORMITY; MAGNETIC FIELD GRADIENT; ION CURRENT DENSITY;

D O I：

10.1143/JJAP.31.4343

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The authors have developed a new multi-coil system for electron cyclotron resonace (ECR) plasma generation. The features of this multi-coil system are precise magnetic field control and the capability of achieving compatibiliry with low magnetic field gradient and high magnetic field uniformity. A low gradient and high uniformity of magnetic field in the ECR region contribute to highly dense and highly uniform plasma generation. Therefore, etching characteristic improvement is expected. As compared with the conventional two-coil system, the present multi-coil system achieved improvement of magnetic field uniformity of more than 60% at a low magnetic field gradient less than 20 G/cm, ion current density of more than 25%, and ion current density uniformity of about 75% in Ar plasma.

引用

页码：4343 / 4347

页数：5

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