AN IMAGE-PROCESSING APPROACH TO FAST, EFFICIENT PROXIMITY CORRECTION FOR ELECTRON-BEAM LITHOGRAPHY

被引：14

作者：

CHOW, DGL

MCDONALD, JF

KING, DC

SMITH, W

MOLNAR, K

STECKL, AJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582705

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1383 / 1390

页数：8

共 12 条

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[4]

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ADESIDA, I ;

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[7]

KERN DP, 1980, 9TH P INT S EL ION B, P326

[8] VERIFICATION OF A PROXIMITY EFFECT CORRECTION PROGRAM IN ELECTRON-BEAM LITHOGRAPHY [J].

KRATSCHMER, E .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1264-1268

[9] CORRECTIONS TO PROXIMITY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY .1. THEORY [J].

PARIKH, M .

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[10]

RABINER LR, 1975, THEORY APPLICATION D

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