CHARACTERIZATION OF NBS STANDARD REFERENCE MATERIAL 2135 FOR SPUTTER DEPTH PROFILE ANALYSIS

被引：49

作者：

FINE, J ^{[1
]}

NAVINSEK, B ^{[1
]}

机构：

[1] EDVARD KARDELJ UNIV, INST JOZEF STEFAN, YU-61000 LJUBLJANA, YUGOSLAVIA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.572790

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1408 / 1412

页数：5

共 34 条

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[10] SPUTTER DEPTH PROFILES OF NI/CR THIN-FILM STRUCTURES OBTAINED FROM THE EMISSION OF AUGER ELECTRONS AND X-RAYS [J].

FINE, J ;

NAVINSEK, B ;

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