INORGANIC-ION BEAM RESIST FOR ADDITIVE PLATING OF METALLIC INTERCONNECTS

被引:3
作者
ESKILDSEN, SS
SORENSEN, G
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D O I
10.1063/1.95775
中图分类号
O59 [应用物理学];
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页码:1101 / 1102
页数:2
相关论文
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[2]  
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[3]  
ESKILDSEN SS, 1985, NUCL INSTRUM M B MAR
[4]  
KREUZ JA, 1982, 25TH I INT PACK EL C
[5]   AIF3 - A NEW VERY HIGH-RESOLUTION ELECTRON-BEAM RESIST [J].
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ISAACSON, M ;
ADESIDA, I .
APPLIED PHYSICS LETTERS, 1984, 45 (05) :589-591