ION-BEAM-INDUCED CHEMICAL-VAPOR-DEPOSITION FOR THE PREPARATION OF THIN-FILM OXIDES

被引：41

作者：

LEINEN, D ^{[1
]}

FERNANDEZ, A ^{[1
]}

ESPINOS, JP ^{[1
]}

BELDERRAIN, TR ^{[1
]}

GONZALEZELIPE, AR ^{[1
]}

机构：

[1] DEPT QUIM INORGAN,E-41008 SEVILLE,SPAIN

来源：

THIN SOLID FILMS | 1994年 / 241卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(94)90425-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this paper an ion beam induced chemical vapor deposition procedure is proposed for the preparation of oxide films. The method consists of the bombardment of a substrate with O2+ ions while a flow of a volatile precursor is directed onto it. The possibilities of the method are illustrated by a TiO2 thin film grown on quartz from Ti(CH3CH2O)4 as precursor. The grown film is studied by X-ray photoelectron spectroscopy, scanning and transmission electron microscopies, and UV-visible spectroscopy. The refractive indexes of the films (between 2.3 and 2.7) are similar to those of other TiO2 thin films prepared by ion beam assisted deposition methods.

引用

页码：198 / 201

页数：4

共 11 条

[1]

Cuomo J. J., 1989, HDB ION BEAM PROCESS

[2] PHOTOEMISSION AND ELECTRON-MICROSCOPY OF SMALL SUPPORTED PALLADIUM CLUSTERS [J].

KUHRT, C ;

HARSDORFF, M .

SURFACE SCIENCE, 1991, 245 (1-2) :173-179

[3] XAS AND XRD STRUCTURAL STUDIES OF TITANIUM-OXIDE THIN-FILMS PREPARED BY ION-BEAM-INDUCED CVD [J].

LEINEN, D ;

FERNANDEZ, A ;

ESPINOS, JP ;

CABALLERO, A ;

JUSTO, A ;

GONZALEZELIPE, AR .

THIN SOLID FILMS, 1994, 241 (1-2) :175-178

[4] TITANIUM-OXIDE FORMATION BY DYNAMIC ION-BEAM MIXING [J].

MIYAKE, S ;

KOBAYASHI, T ;

SATOU, M ;

FUJIMOTO, F .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (06) :3036-3040

[5] PREPARATION AND PROPERTIES OF (PB,LA)(ZR,TI)O3 THIN-FILMS BY METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].

OKADA, M ;

TOMINAGA, K .

JOURNAL OF APPLIED PHYSICS, 1992, 71 (04) :1955-1959

[6]

POUGRATZ S, 1992, J VAC SCI TECHNOL A, V10, P1897

[7] DEPOSITION OF OPTICAL COATINGS BY LASER-ASSISTED EVAPORATION AND BY PHOTO-ASSISTED CHEMICAL VAPOR-DEPOSITION [J].

SANKUR, H .

THIN SOLID FILMS, 1992, 218 (1-2) :161-169

[8] TITANIUM-DIOXIDE COATINGS - ROOM-TEMPERATURE DEPOSITION [J].

SLADEK, KJ ;

HERRON, HM .

INDUSTRIAL & ENGINEERING CHEMISTRY PRODUCT RESEARCH AND DEVELOPMENT, 1972, 11 (01) :92-&

[9]

Swanepoel R., 1983, J PHYS E, V16, P1213

[10]

VANBUSKIRK PC, 1992, J VAC SCI TECHNOL A, V10, P1955

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