SILICIDE FORMATION AND INTERDIFFUSION EFFECTS IN SI-TA, SIO2-TA AND SI-PTSI-TA THIN-FILM STRUCTURES

被引：35

作者：

CHRISTOU, A ^{[1
]}

DAY, HM ^{[1
]}

机构：

[1] USN,RES LAB,WASHINGTON,DC 20375

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1976年 / 5卷 / 01期

关键词：

D O I：

10.1007/BF02652882

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

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页码：1 / 12

页数：12

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共 15 条

[1] STABILIZED TANTALUM DIFFUSION BARRIER FOR GOLD METALLIZATION SYSTEM
CHRISTOU, A
DAY, HM
[J]. JOURNAL OF ELECTRONIC MATERIALS, 1974, 3 (01) : 25 - 35
[2] RELIABILITY OF GOLD-STABILIZED TANTALUM METALLIZATIONS FOR MICROWAVE-POWER TRANSISTORS
CHRISTOU, A
DAY, HM
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (08) : 1076 - 1081
[3] SEM, AUGER-SPECTROSCOPY AND ION BACKSCATTERING TECHNIQUES APPLIED TO ANALYSES OF AU-REFRACTORY METALLIZATIONS
CHRISTOU, A
JARVIS, L
WEISENBERGER, WH
HIRVONEN, JK
[J]. JOURNAL OF ELECTRONIC MATERIALS, 1975, 4 (02) : 329 - 345
[4] REACTIONS BETWEEN TA-PT-TA-AU METALLIZATION AND PTSI OHMIC CONTACTS
DAY, HM
CHRISTOU, A
WEISENBERGER, WH
HIRVONEN, JK
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (06) : 769 - 772
[5] Elliot R.P., 1965, CONSTITUTION BINA S1
[6] SEEMAN-BOHLIN X-RAY DIFFRACTOMETER FOR THIN FILMS
FEDER, R
BERRY, BS
[J]. JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1970, 3 (OCT1) : 372 - &
[7] HULTGREN R, 1968, VALUES THERMODYNAMIC
[8] MARCUS RB, 1967, MEASUREMENT TECHNIQU, P1
[9] ANALYSIS OF THIN-FILM STRUCTURES WITH NUCLEAR BACKSCATTERING AND X-RAY-DIFFRACTION
MAYER, JW
TU, KN
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 86 - 93
[10] USE OF AUGER-ELECTRON SPECTROSCOPY AND INERT-GAS SPUTTERING FOR OBTAINING CHEMICAL PROFILES
PALMBERG, PW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01): : 160 - &