SILICIDE FORMATION AND INTERDIFFUSION EFFECTS IN SI-TA, SIO2-TA AND SI-PTSI-TA THIN-FILM STRUCTURES

被引：35

作者：

CHRISTOU, A ^{[1
]}

DAY, HM ^{[1
]}

机构：

[1] USN,RES LAB,WASHINGTON,DC 20375

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1976年 / 5卷 / 01期

关键词：

D O I：

10.1007/BF02652882

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1 / 12

页数：12

共 15 条

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[8]

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