MICROPATTERNING OF HIGH-TC FILMS WITH AN EXCIMER LASER

被引:46
作者
MANNHART, J
SCHEUERMANN, M
TSUEI, CC
OPRYSKO, MM
CHI, CC
UMBACH, CP
KOCH, RH
MILLER, C
机构
关键词
D O I
10.1063/1.99678
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:1271 / 1273
页数:3
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