FORMATION AND PROPERTIES OF TISI2 FILMS

被引：40
作者：
GULDAN, A [1 ]
SCHILLER, V [1 ]
STEFFEN, A [1 ]
BALK, P [1 ]
机构：
[1] AACHEN TECH UNIV,INST SEMICOND ELECTR,SONDERFORSCH BEREICH FESTKORPERELECTR 56,AACHEN,FED REP GER
来源：
THIN SOLID FILMS | 1983年 / 100卷 / 01期
关键词：
D O I：
10.1016/0040-6090(83)90223-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：1 / 7
页数：7
相关论文
共 7 条
[1]  
MOHAMMADI F, 1981, SOLID STATE TECHNOL, V24, P65
[2]   THIN-FILM INTERACTION BETWEEN TITANIUM AND POLYCRYSTALLINE SILICON [J].
MURARKA, SP ;
FRASER, DB .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) :342-349
[3]   SILICIDE FORMATION IN THIN CO-SPUTTERED (TITANIUM + SILICON) FILMS ON POLYCRYSTALLINE SILICON AND SIO2 [J].
MURARKA, SP ;
FRASER, DB .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) :350-356
[4]  
MURARKA SP, 1981, 4TH P INT S SIL MAT, P551
[5]   REVIEW OF BINARY ALLOY FORMATION BY THIN-FILM INTERACTIONS [J].
OTTAVIANI, G .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (05) :1112-1119
[6]  
PINIZOTTO RF, 1981, 4TH P INT S SIL MAT, P562
[7]  
1981, GMELIN HDB ANORGANIS
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