ION CHANNELING ANALYSIS OF A SI1-XGEX(AS)/SI STRAINED LAYER

被引：4
|
作者：
MOORE, JA
LENNARD, WN
MASSOUMI, GR
JACKMAN, TE
BARIBEAU, JM
JACKMAN, JA
机构：
[1] UNIV WESTERN ONTARIO,LONDON N6A 3K7,ONTARIO,CANADA
[2] NATL RES COUNCIL CANADA,OTTAWA K1A 0R6,ONTARIO,CANADA
[3] ENERGY MINES & RESOURCES CANADA,OTTAWA K1A 0G1,ONTARIO,CANADA
来源：
APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 25期
关键词：
D O I：
10.1063/1.101364
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2571 / 2573
页数：3
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