EFFECT OF SPUTTERING CONDITIONS, ANNEALING AND THE MICROSTRUCTURE OF CR UNDERLAYER ON THE MAGNETIC-PROPERTIES OF CONICR/CR THIN-FILMS

被引:17
作者
DUAN, SL [1 ]
ARTMAN, JO [1 ]
LEE, JW [1 ]
WONG, B [1 ]
LAUGHLIN, DE [1 ]
机构
[1] CARNEGIE MELLON UNIV,DEPT MET ENGN & MAT SCI,PITTSBURGH,PA 15213
关键词
D O I
10.1109/20.42467
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:3884 / 3886
页数:3
相关论文
共 9 条
[1]   EFFECT OF ION-BOMBARDMENT DURING DEPOSITION ON THICK METAL AND CERAMIC DEPOSITS [J].
BLAND, RD ;
KOMINIAK, GJ ;
MATTOX, DM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04) :671-674
[2]  
CHEN GL, 1986, IEEE T MAGN, V22, P334, DOI 10.1109/TMAG.1986.1064410
[3]  
DUAN SL, IN PRESS J PHYSIQUE
[4]   PROPERTIES OF MANGANESE-PERMALLOY FILMS [J].
GRIEST, AJ ;
FLUR, BL .
JOURNAL OF APPLIED PHYSICS, 1967, 38 (03) :1431-&
[5]   EFFECTS OF OXYGEN ON PROPERTIES OF RF SPUTTERED NIFE FILMS [J].
HAMMER, WN ;
AHN, KY .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (04) :804-807
[6]   DEPOSITION OF TANTALUM TANTALUM OXIDE AND TANTALUM NITRIDE WITH CONTROLLED ELECTRICAL CHARACTERISTICS [J].
KRIKORIAN, E ;
SNEED, RJ .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (10) :3674-+
[7]  
LAEFREID N, 1961, J APPL PHYS, V32, P365
[8]  
MAISSEL LI, 1970, HDB THIN FILM TECHNO, pCH4
[9]   CONICR/CR SPUTTERED THIN-FILM DISKS [J].
YAMADA, T ;
TANI, N ;
ISHIKAWA, M ;
OTA, Y ;
NAKAMURA, K ;
ITOH, A .
IEEE TRANSACTIONS ON MAGNETICS, 1985, 21 (05) :1429-1431