CO/SI(111) INTERFACE FORMATION AT ROOM-TEMPERATURE

被引:36
作者
DERRIEN, J [1 ]
DECRESCENZI, M [1 ]
CHAINET, E [1 ]
DANTERROCHES, C [1 ]
PIRRI, C [1 ]
GEWINNER, G [1 ]
PERUCHETTI, JC [1 ]
机构
[1] LAB PHYS & SPECT ELECTR,F-68093 MULHOUSE,FRANCE
来源
PHYSICAL REVIEW B | 1987年 / 36卷 / 12期
关键词
D O I
10.1103/PhysRevB.36.6681
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:6681 / 6684
页数:4
相关论文
共 24 条
[1]   CORRELATION-EFFECTS IN VALENCE-BAND SPECTRA OF NICKEL SILICIDES [J].
BISI, O ;
CALANDRA, C ;
DELPENNINO, U ;
SASSAROLI, P ;
VALERI, S .
PHYSICAL REVIEW B, 1984, 30 (10) :5696-5703
[2]   HIGH-RESOLUTION PHOTOEMISSION-STUDY OF CO/SI(111) INTERFACE FORMATION [J].
BOSCHERINI, F ;
JOYCE, JJ ;
RUCKMAN, MW ;
WEAVER, JH .
PHYSICAL REVIEW B, 1987, 35 (09) :4216-4220
[3]   THE STRUCTURE AND PROPERTIES OF METAL-SEMICONDUCTOR INTERFACES [J].
Brillson, L. J. .
SURFACE SCIENCE REPORTS, 1982, 2 (02) :123-326
[4]  
CHAINET E, 1986, SURF SCI, V168, P309
[5]   FORMATION AND STRUCTURE OF EPITAXIAL NISI2 AND COSI2 [J].
CHEN, LJ ;
MAYER, JW ;
TU, KN .
THIN SOLID FILMS, 1982, 93 (1-2) :135-141
[6]   COMMENT ON QUASI-ATOMIC AUGER-SPECTRA IN NARROW-BAND METALS [J].
CINI, M .
PHYSICAL REVIEW B, 1978, 17 (06) :2788-2789
[8]  
DAVITAYA A, 1985, J VAC SCI TECHNOL B, V3, P770
[9]   SILICON OVERGROWTH ON COSI2/SI(111) EPITAXIAL STRUCTURES - APPLICATION TO PERMEABLE BASE TRANSISTOR [J].
DAVITAYA, FA ;
CHROBOCZEK, JA ;
DANTERROCHES, C ;
GLASTRE, G ;
CAMPIDELLI, Y ;
ROSENCHER, E .
JOURNAL OF CRYSTAL GROWTH, 1987, 81 (1-4) :463-469
[10]   STRUCTURAL AND ELECTRONIC-PROPERTIES OF COSI2 EPITAXIALLY GROWN ON SI(111) [J].
DERRIEN, J .
SURFACE SCIENCE, 1986, 168 (1-3) :171-183