MICROWAVE MULTIPOLAR PLASMA FOR ETCHING AND DEPOSITION

被引：8

作者：

BURKE, RR ^{[1
]}

POMOT, C ^{[1
]}

机构：

[1] CTR NATL ETUD TELECOMMUN,CTR MICROELECTR NORBERT SEGARD,CNRS,UNITE RECH DO328,F-38243 MEYLAN,FRANCE

来源：

APPLIED SURFACE SCIENCE | 1989年 / 36卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(89)90922-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：267 / 277

页数：11

共 28 条

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