共 50 条
- [2] Depth profiling of polishing-induced contamination on fused silica surfaces LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1997, PROCEEDINGS, 1998, 3244 : 365 - 375
- [6] Reduction of defects caused by chemical mechanical polishing of oxide surfaces and contamination of the wafer bevel 2009 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE, 2009, : 1 - 4
- [9] Current Possibilities of Electron Spectroscopy for Chemical Analysis (ESCA) in the Study of Metal Surfaces. Metaux corrosion-industries, 1981, 56 (666): : 66 - 74