MEASUREMENT OF PLASMA POTENTIAL USING COLLECTING AND EMITTING PROBES

被引：41
作者：
HERSHKOWITZ, N
CHO, MH
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期
关键词：
D O I：
10.1116/1.575600
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
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页码：2054 / 2059
页数：6
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