INFLUENCE OF RIGID POLYMER MATRICES ON REVERSIBLE PHOTOCHEMICAL REACTION OF ALPHA-PARA-DIMETHYLAMINOPHENYL-N-META-NITROPHENYLNITRONE

The thermally reversible photocyclization of alpha -p-dimethylaminophenyl-N-m-nitrophenylnitrone (I) to the corresponding oxaziridine (II) was studied in solution and in rigid polymer matrices. Irradiation with light of wavelength above 380 nm causes a clean transformation of (I) to (II) in solution as well as in polymer matrices. The quantum yield of the photoreaction in solution is about 0. 06, the value being almost independent of the nature of the solvent and the irradiation time. In PMMA and in PS films, the photocyclization shows initial quantum yields of 0. 1 and 0. 23, respectively, which decrease with irradiation time. In solution in the dark, II reverted mainly to I with formation of side product(s) in a first-order reaction. The recovery of I during the dark reaction (60 - 90%) as well as the rate constant of the reaction are strongly affected by the solvent. The kinetics of the thermal return in the two polymer matrices does not follow the first-order rate law. The initial reaction rate as well as the extent of the recovery of I in PMMA film are greater than those in ethyl acetate.