DISSOLUTION KINETICS IN LANGMUIR-BLODGETT FILMS OF SOLID-STATE POLYMERIZED OMEGA-TRICOSENOIC ACID

被引:11
作者
BARRAUD, A
机构
来源
MOLECULAR CRYSTALS AND LIQUID CRYSTALS | 1983年 / 96卷 / 1-4期
关键词
D O I
10.1080/00268948308074716
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
引用
收藏
页码:353 / 359
页数:7
相关论文
共 8 条
[1]   POLYMERIZED MONO-MOLECULAR LAYERS - A NEW CLASS OF ULTRATHIN RESINS FOR MICROLITHOGRAPHY [J].
BARRAUD, A ;
ROSILIO, C ;
RUAUDELTEIXIER, A .
THIN SOLID FILMS, 1980, 68 (01) :91-98
[2]   SOLID-STATE ELECTRON-INDUCED POLYMERIZATION OF OMEGA-TRICOSENOIC ACID MULTILAYERS [J].
BARRAUD, A ;
ROSILIO, C ;
RUAUDELTEIXIER, A .
JOURNAL OF COLLOID AND INTERFACE SCIENCE, 1977, 62 (03) :509-523
[3]   MODEL OF THE DISSOLUTION OF MONO-MOLECULAR PHOTORESISTS [J].
BARRAUD, A .
THIN SOLID FILMS, 1981, 85 (01) :77-85
[4]   RECENT IMPROVEMENTS IN MONO-MOLECULAR RESISTS [J].
BARRAUD, A ;
ROSILIO, C ;
RUAUDELTEIXIER, A .
THIN SOLID FILMS, 1980, 68 (01) :99-100
[5]   MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS [J].
DILL, FH ;
NEUREUTHER, AR ;
TUTTLE, JA ;
WALKER, EJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :456-464
[6]   COMPUTER-SIMULATION OF EXPOSURE AND DEVELOPMENT OF A POSITIVE PHOTORESIST [J].
FUJIMORI, S .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :615-623
[7]   DEVELOPER CHARACTERISTICS OF POLY-(METHYL METHACRYLATE) ELECTRON RESIST [J].
GREENEICH, JS .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (07) :970-976
[8]  
Schmidt G.M.J., 1967, REACTIVITY PHOTOEXCI, P227