CHEMICAL VAPOR-DEPOSITION OF COBALT SILICIDE

被引：33

作者：

WEST, GA

BEESON, KW

机构：

来源：

关键词：

D O I：

10.1063/1.100558

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：740 / 742

页数：3

共 20 条

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[7] PROPERTIES OF MOLYBDENUM SILICIDE FILM DEPOSITED BY CHEMICAL VAPOR-DEPOSITION
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[8] KEHR DER, 1987, 6TH P INT C CHEM VAP, P511
[9] THERMAL AND CHEMICAL-STABILITY OF SCHOTTKY METALLIZATION ON GAAS
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[J]. APPLIED PHYSICS LETTERS, 1985, 47 (12) : 1298 - 1300
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