FORMATION AND NONDESTRUCTIVE CHARACTERIZATION OF ION-IMPLANTED SILICON-ON-INSULATOR LAYERS

被引：34
作者：
NARAYAN, J
KIM, SY
VEDAM, K
MANUKONDA, R
机构：
[1] PENN STATE UNIV,MAT RES LAB,UNIVERSITY PK,PA 16802
[2] HONEYWELL INC,DIV SOLID STATE ELECTR,PLYMOUTH,MN 55441
来源：
APPLIED PHYSICS LETTERS | 1987年 / 51卷 / 05期
关键词：
D O I：
10.1063/1.98435
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：343 / 345
页数：3
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