THERMAL ANNEALING BEHAVIOR OF SI/SIO2 STRUCTURES

被引：13

作者：

LIFSHITS, VG

KAVERINA, IG

KOROBTSOV, VV

SARANIN, AA

ZOTOV, AV

机构：

来源：

THIN SOLID FILMS | 1986年 / 135卷 / 01期

关键词：

D O I：

10.1016/0040-6090(86)90092-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：99 / 105

页数：7

共 16 条

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