LOW-TEMPERATURE PREPARATION OF SIO2 IN MAKING QUARTZ GLASS

被引：0
作者：
KOSTINA, VM
LOGINOV, AF
POTAPOVA, GV
机构：
来源：
INORGANIC MATERIALS | 1991年 / 27卷 / 12期
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：2265 / 2269
页数：5
相关论文
共 50 条
  • [21] Preparation and performance analysis of low-temperature SiO2 aerogel-based phase change composites
    Yu Yuxi
    Jia Yanting
    Huang Liuying
    Zhu Jian
    Cong Minghui
    Song Jingyuan
    CAILIAO GONGCHENG-JOURNAL OF MATERIALS ENGINEERING, 2022, 50 (08): : 115 - 123
  • [22] CRYSTAL-STRUCTURES OF THE LOW-TEMPERATURE QUARTZ-TYPE PHASES OF SIO2 AND GEO2 AT ELEVATED PRESSURE
    GLINNEMANN, J
    KING, HE
    SCHULZ, H
    HAHN, T
    LAPLACA, SJ
    DACOL, F
    ZEITSCHRIFT FUR KRISTALLOGRAPHIE, 1992, 198 (3-4): : 177 - 212
  • [23] GENERATION OF SIO2 INTERFACE STATES AT LOW-TEMPERATURE WITH IONIZING IRRADIATION
    BLUZER, N
    AFFINITO, D
    BLAHA, FC
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1981, 28 (06) : 4074 - 4079
  • [24] Low-Temperature Atomic Hydrogen Treatment of SiO2/Si Structures
    Zhang, Hong
    Kumagai, Akira
    Xu, Ge
    Ishibashi, Keiji
    1600, Japan Society of Applied Physics (42):
  • [25] Low-temperature APCVD of SiO2 from TEOS/ozone.
    Flores, LD
    Tindall, C
    Crowell, JE
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1999, 218 : U463 - U463
  • [26] Low-temperature deposition of ultrathin SiO2 films on Si substrates
    Vitanov, P.
    Harizanova, A.
    Ivanova, T.
    Dikov, H.
    18TH INTERNATIONAL SUMMER SCHOOL ON VACUUM, ELECTRON AND ION TECHNOLOGIES (VEIT2013), 2014, 514
  • [27] LOW-TEMPERATURE PYROLYTIC DEPOSITION OF HIGH-QUALITY SIO2
    BENNETT, BR
    LORENZO, JP
    VACCARO, K
    DAVIS, A
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (10) : 2517 - 2521
  • [28] PHONONS IN SIO2 - LOW-TEMPERATURE HEAT-CAPACITY OF CRISTOBALITE
    BILIR, N
    PHILLIPS, WA
    PHILOSOPHICAL MAGAZINE, 1975, 32 (01): : 113 - 122
  • [29] ELECTRICAL-PROPERTIES OF LOW-TEMPERATURE PYROLYTIC SIO2 ON INP
    BENNETT, BR
    LORENZO, JP
    VACCARO, K
    ELECTRONICS LETTERS, 1988, 24 (03) : 172 - 173
  • [30] Low-temperature atomic hydrogen treatment of SiO2/Si structures
    Zhang, H
    Kumagai, A
    Xu, G
    Ishibashi, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (10): : 6252 - 6255
12345