ENHANCED DIFFUSION IN SHORT-TIME ANNEALED ARSENIC AND BORON ION-IMPLANTED SILICON

被引：0
作者：
SEDGWICK, TO
COHEN, SA
OEHRLEIN, G
DELINE, V
KALISH, R
SHATAS, S
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
[2] AG ASSOCIATES,PALO ALTO,CA 94303
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C83 / C83
页数：1
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