ELECTRON TUNNELING IN METAL-SEMICONDUCTOR BARRIERS

被引:124
作者
CONLEY, JW
DUKE, CB
MAHAN, GD
TIEMANN, JJ
机构
来源
PHYSICAL REVIEW | 1966年 / 150卷 / 02期
关键词
D O I
10.1103/PhysRev.150.466
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:466 / &
相关论文
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