GROWTH MECHANISMS OF SILICA GLASSES USING THE LIQUID-PHASE DEPOSITION (LPD)

被引：25

作者：

AWAZU, K ^{[1
]}

KAWAZOE, H ^{[1
]}

SEKI, K ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,ENGN MAT RES LAB,MIDORI KU,YOKOHAMA,KANAGAWA 227,JAPAN

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1992年 / 151卷 / 1-2期

关键词：

D O I：

10.1016/0022-3093(92)90015-C

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Silica glasses were fabricated using liquid phase deposition (LPD) and process mechanisms were studied. The dependence of deposition rate as a function of boric acid was measured, the structure of the films was examined by IR spectroscopy and chemical species in the solution were identified using Raman spectroscopy. Some imperfections in the deposited films were detected corresponding to a 910 cm-1 IR band. SiF62-, BO33-, and BF4- were detected in the solution. Thus, it is proposed that the reactions sequences H2SiF6 + 2H2O --> 6HF + SiO2 and H3BO3 + 4HF --> BF4- + H3O+ + 2H2O occur in the solution.

引用

页码：102 / 108

页数：7

共 17 条

[1] SIMULTANEOUS GENERATION OF THE 7.6-EV OPTICAL-ABSORPTION BAND AND F2 MOLECULE IN FLUORINE DOPED SILICA GLASS UNDER ANNEALING [J].