Multiple Processes during the Sputtering of Materials by Ion Bombardment

被引：3
作者：
Oksengendler, B. L. [1 ]
Maksimov, S. E. [1 ]
Turaeva, N. N. [2 ]
Turaev, N. Yu. [1 ]
机构：
[1] Uzbek Acad Sci, Inst Ion Plasma & Laser Technol, Tashkent 100125, Uzbekistan
[2] Uzbek Acad Sci, Inst Chem & Phys Polymers, Tashkent 100128, Uzbekistan
来源：
JOURNAL OF SURFACE INVESTIGATION | 2013年 / 7卷 / 03期
关键词：
Ion bombardment;
D O I：
10.1134/S1027451013020419
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
A new method of statistical analysis dedicated to filling the gap between dynamic and thermody-namic theories of secondary-particle emission under ion bombardment is proposed. Expressions for the aver- age number of emitted atomic particles and electrons are obtained, and the relationships between their yields are established.
引用
收藏
页码：557 / 561
页数：5
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