SIMPLE DIRECT MONITORING OF SIH3 RADICAL AND PARTICULATES IN A SILANE PLASMA WITH ULTRAVIOLET TRANSMISSION SPECTROSCOPY

被引：13

作者：

TOYODA, H ^{[1
]}

GOTO, M ^{[1
]}

KITAGAWA, M ^{[1
]}

HIRAO, T ^{[1
]}

SUGAI, H ^{[1
]}

机构：

[1] MATSUSHITA ELECT IND CO,CENT RES LAB,KYOTO 61902,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1995年 / 34卷 / 4A期

关键词：

UV TRANSMISSION SPECTROSCOPY; SIH3; RADICAL; SILANE PLASMA; PARTICULATE; POWDER; MIE SCATTERING;

D O I：

10.1143/JJAP.34.L448

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The silyl radical (SiH3) in a H-2/SiH4 rf plasma, is successfully detected by an easy and inexpensive method, i.e., high-sensitivity ultraviolet transmission spectroscopy (UVTS). The diffusive absorption band of the SiH3 radical is observed in the 205-240 nm region. The relative SiH3 density is measured as a function of RF power from 20 to 100 mW/cm(2) by UVTS. The UV transmittance is very sensitive to particulates in the plasma, thus enabling both particulates and SiH3 radicals to be monitored simultaneously.

引用

页码：L448 / L451

页数：4

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