EPITAXIAL-GROWTH OF MGO THIN-FILMS ON SILICON BY DUAL ION-BEAM SPUTTERING

被引：16
作者：
LI, YJ
XIONG, GC
LIAN, GJ
LI, J
GAN, ZH
机构：
[1] Department of Physics, Peking University, Beijing
来源：
THIN SOLID FILMS | 1993年 / 223卷 / 01期
关键词：
D O I：
10.1016/0040-6090(93)90720-A
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：11 / 13
页数：3
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