EPITAXIAL-GROWTH OF MGO THIN-FILMS ON SILICON BY DUAL ION-BEAM SPUTTERING

被引:16
|
作者
LI, YJ
XIONG, GC
LIAN, GJ
LI, J
GAN, ZH
机构
[1] Department of Physics, Peking University, Beijing
关键词
D O I
10.1016/0040-6090(93)90720-A
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
引用
收藏
页码:11 / 13
页数:3
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