MAGNETORESISTANCE OF CO-BASED MULTILAYERED STRUCTURES

被引：28

作者：

MOSCA, DH

BARTHELEMY, A

PETROFF, F

FERT, A

SCHROEDER, PA

PRATT, WP

LALOEE, R

CABANEL, R

机构：

[1] MICHIGAN STATE UNIV,DEPT PHYS & ASTRON,E LANSING,MI 48824

[2] THOMSON CSF,CENT RECH LAB,F-91401 ORSAY,FRANCE

[3] UNIV FED RIO GRANDE SUL,BR-91500 PORTO ALEGRE,BRAZIL

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1991年 / 93卷

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0304-8853(91)90389-R

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Magnetoresistance measurements have been made on sputtered multilayered films of Ag/Co and Cu/Co. Magnetoresistances as high as 16% at 4.2K have been measured in the field range where the magnetization reverses. The results are ascribed to the partial antiparallel arrangement of the magnetizations in alternate Co layers.

引用

页码：480 / 484

页数：5

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