ON THE DYNAMICS OF AN ISOTHERMAL RADIAL-FLOW PLASMA ETCHER

被引：9
|
作者：
VENKATESAN, SP
EDGAR, TF
TRACHTENBERG, I
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 09期
关键词：
D O I：
10.1149/1.2097461
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：2532 / 2545
页数：14
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