CHEMICALLY VAPOR-DEPOSITED TUNGSTEN, GRAIN-REFINED AND STABILIZED

被引：7

作者：

BRYANT, WA ^{[1
]}

机构：

[1] WESTINGHOUSE ELECT CORP,ASTRONUCL LAB,POB 10864,PITTSBURGH,PA 15236

来源：

JOURNAL OF THE LESS-COMMON METALS | 1976年 / 45卷 / 01期

关键词：

D O I：

10.1016/0022-5088(76)90194-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：37 / 44

页数：8

共 50 条

[21] MECHANICAL BEHAVIOR OF CHEMICAL VAPOR-DEPOSITED TUNGSTEN
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[30] MICROMECHANICAL CHARACTERIZATION OF CHEMICALLY VAPOR-DEPOSITED CERAMIC FILMS
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