CHEMICALLY VAPOR-DEPOSITED TUNGSTEN, GRAIN-REFINED AND STABILIZED

被引：7

作者：

BRYANT, WA ^{[1
]}

机构：

[1] WESTINGHOUSE ELECT CORP,ASTRONUCL LAB,POB 10864,PITTSBURGH,PA 15236

来源：

JOURNAL OF THE LESS-COMMON METALS | 1976年 / 45卷 / 01期

关键词：

D O I：

10.1016/0022-5088(76)90194-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：37 / 44

页数：8

共 50 条

[1] WELDABILITY OF 3 FORMS OF CHEMICALLY VAPOR-DEPOSITED TUNGSTEN
BRYANT, WA
GOLD, RE
WELDING JOURNAL, 1975, 54 (11) : S405 - S408
[2] RESISTIVITY, GRAIN-SIZE, AND IMPURITY EFFECTS IN CHEMICALLY VAPOR-DEPOSITED TUNGSTEN FILMS
LEARN, AJ
FOSTER, DW
JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2001 - 2007
[3] THERMIONIC WORK FUNCTION OF CHEMICALLY VAPOR-DEPOSITED RHENIUM ON TUNGSTEN
WALL, R
JACOBSON, D
JOURNAL OF MATERIALS ENGINEERING, 1989, 11 (03) : 197 - 200
[4] KINETICS AND PROPERTIES OF CHEMICALLY VAPOR-DEPOSITED TUNGSTEN FILMS ON SILICON SUBSTRATES
MOROSANU, CE
SOLTUZ, V
THIN SOLID FILMS, 1978, 52 (02) : 181 - 194
[5] THE CURRENT STATUS OF CHEMICALLY VAPOR-DEPOSITED TUNGSTEN AS AN INTEGRATED-CIRCUIT METALLIZATION
GREEN, ML
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C476 - C476
[6] NUCLEATION AND GROWTH OF CHEMICALLY VAPOR-DEPOSITED TUNGSTEN ON VARIOUS SUBSTRATE MATERIALS - A REVIEW
BROADBENT, EK
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (06): : 1661 - 1666
[7] CHEMICALLY VAPOR-DEPOSITED TUNGSTEN - ITS HIGH-TEMPERATURE STRENGTH AND DUCTILITY
BRYANT, WA
JOURNAL OF THE LESS-COMMON METALS, 1977, 53 (01): : 35 - 42
[8] STRUCTURE OF SELECTIVE LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED FILMS OF TUNGSTEN
GREEN, ML
LEVY, RA
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (05) : 1243 - 1250
[9] CHARACTERIZATION OF LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED TUNGSTEN NITRIDE FILMS
MARCUS, SD
FOSTER, RF
THIN SOLID FILMS, 1993, 236 (1-2) : 330 - 333
[10] CHEMICALLY VAPOR-DEPOSITED MATERIALS FOR RAILGUNS
HARDING, JT
KAPLAN, RB
PIERSON, HO
TUFFIAS, RH
UPSHAW, JL
IEEE TRANSACTIONS ON MAGNETICS, 1986, 22 (06) : 1506 - 1509

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