MECHANISMS OF AMORPHIZATION AND RECRYSTALLIZATION IN ION-IMPLANTED III-V COMPOUND SEMICONDUCTORS

被引：110
作者：
SADANA, DK
机构：
[1] MICROELECTR CTR N CAROLINA,RES TRIANGLE PK,NC 27709
[2] N CAROLINA STATE UNIV,DEPT MAT ENGN,RALEIGH,NC 27640
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1985年 / 7-8卷 / MAR期
关键词：
D O I：
10.1016/0168-583X(85)90585-3
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：375 / 386
页数：12
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