MICROPROBE AUGER ANALYSIS OF SI MIGRATION IN AL METALLIZATION FOR LSI

被引：7

作者：

INOUE, T

HORIUCHI, S

IWAI, H

SHIMIZU, H

ISHIDA, T

机构：

[1] TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,SAIWAI KU,KAWASAKI 210,JAPAN

[2] ELECTROTECH LAB,TOKYO 188,JAPAN

[3] NIPPON ELECT VARIAN CO LTD,TOKYO 183,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1976年 / 15卷

关键词：

D O I：

10.7567/JJAPS.15S1.63

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：63 / 69

页数：7

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